Antireflective structure imprinted on the surface of optical glass by SiC mold

An antireflective structure with two-dimensional 300-nm periodicity was fabricated on a phosphate glass surface using an imprinting process with a SiC mold. The optimized structure designed using RCWA calculation was a convex circular cone sharing the ridge line of adjacent cones. The SiC mold was f...

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Bibliographic Details
Published in:Applied surface science 2009-01, Vol.255 (7), p.4267-4270
Main Authors: Yamada, Kazuhiro, Umetani, Makoto, Tamura, Takamasa, Tanaka, Yasuhiro, Kasa, Haruya, Nishii, Junji
Format: Article
Language:English
Subjects:
Antireflective surface
Electron beam lithography
Glass
Optical element
Reactive ion etching
Subwavelength structure
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Summary:An antireflective structure with two-dimensional 300-nm periodicity was fabricated on a phosphate glass surface using an imprinting process with a SiC mold. The optimized structure designed using RCWA calculation was a convex circular cone sharing the ridge line of adjacent cones. The SiC mold was fabricated using electron beam drawing and subsequent reactive ion etching with CHF 3 and O 2 gases. The glass’ surface reflectance was estimated as 0.2% at 530 nm wavelength, which was approximately 1/20 that of the optically polished surface.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2008.11.020