One-step process to deposit a soft super-hydrophobic film by filamentary dielectric barrier discharge-assisted CVD using HMCTSO as a precursor

In this study, a relatively simple process is used to deposit a soft super-hydrophobic film using hexamethylcyclotrisiloxane as a precursor by dielectric barrier discharge-assisted chemical vapor deposition. The purpose of this study is to introduce a phenomenon of the creation of a double rough str...

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Bibliographic Details
Published in:Surface & coatings technology 2009-11, Vol.204 (4), p.428-432
Main Authors: Kim, M.C., Klages, C.-P.
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Dielectric barrier discharge
Double rough structure
Exact sciences and technology
Materials science
Physics
Super-hydrophobic
Surface treatments
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Summary:In this study, a relatively simple process is used to deposit a soft super-hydrophobic film using hexamethylcyclotrisiloxane as a precursor by dielectric barrier discharge-assisted chemical vapor deposition. The purpose of this study is to introduce a phenomenon of the creation of a double rough structure on a substrate. A maximum contact angle of approximately 162° was obtained and the film grew in the shape of a double roughness structure, similar to a lotus leaf, indicating a super-hydrophobic surface. The results of the aging test indicated that the as-grown super-hydrophobic surface was stable against moisture and was only dependent on the growing structure of films.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2009.08.002