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Influence of substrate temperature on formation of ultrananocrystalline diamond films deposited by HFCVD argon-rich gas mixture
The influence of the substrate temperature on the formation of ultrananocrystalline diamond (UNCD) thin films, prepared by an argon-based hot filament chemical vapor deposition (HFCVD), is discussed in this work. The gas mixture used for diamond growth was 1 vol.% methane, 9 vol.% hydrogen and 90 vo...
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Published in: | Diamond and related materials 2009-10, Vol.18 (10), p.1283-1288 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The influence of the substrate temperature on the formation of ultrananocrystalline diamond (UNCD) thin films, prepared by an argon-based hot filament chemical vapor deposition (HFCVD), is discussed in this work. The gas mixture used for diamond growth was 1 vol.% methane, 9 vol.% hydrogen and 90 vol.% argon at a total flow rate of 200 sccm and at a total pressure of 30 Torr. The substrate temperature range was from 550 to 850 °C at deposition time of 8 h. Mass growth rate was determined at different deposition temperatures. The activation energy for UNCD growth, determined from the Arrhenius plot, was lower (5.7 kcal/mol) than the values found for standard diamond deposition (around 11 kcal/mol). In this work, we suggest that the activation energy was lower because the growth of these films occurs at conditions that there is a high growth competition between diamond phase and sp
2 phases. To support this hypothesis, systematic characterization studies based on Raman scattering spectroscopy, high-resolution X-ray diffractometry and high-resolution scanning electron microscopy were performed. |
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ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/j.diamond.2009.05.002 |