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Influence of substrate temperature on formation of ultrananocrystalline diamond films deposited by HFCVD argon-rich gas mixture

The influence of the substrate temperature on the formation of ultrananocrystalline diamond (UNCD) thin films, prepared by an argon-based hot filament chemical vapor deposition (HFCVD), is discussed in this work. The gas mixture used for diamond growth was 1 vol.% methane, 9 vol.% hydrogen and 90 vo...

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Published in:Diamond and related materials 2009-10, Vol.18 (10), p.1283-1288
Main Authors: Barbosa, D.C., Almeida, F.A., Silva, R.F., Ferreira, N.G., Trava-Airoldi, V.J., Corat, E.J.
Format: Article
Language:English
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Summary:The influence of the substrate temperature on the formation of ultrananocrystalline diamond (UNCD) thin films, prepared by an argon-based hot filament chemical vapor deposition (HFCVD), is discussed in this work. The gas mixture used for diamond growth was 1 vol.% methane, 9 vol.% hydrogen and 90 vol.% argon at a total flow rate of 200 sccm and at a total pressure of 30 Torr. The substrate temperature range was from 550 to 850 °C at deposition time of 8 h. Mass growth rate was determined at different deposition temperatures. The activation energy for UNCD growth, determined from the Arrhenius plot, was lower (5.7 kcal/mol) than the values found for standard diamond deposition (around 11 kcal/mol). In this work, we suggest that the activation energy was lower because the growth of these films occurs at conditions that there is a high growth competition between diamond phase and sp 2 phases. To support this hypothesis, systematic characterization studies based on Raman scattering spectroscopy, high-resolution X-ray diffractometry and high-resolution scanning electron microscopy were performed.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2009.05.002