A New Route to the Production and Nanoscale Patterning of Highly Smooth, Ultrathin Zirconium Oxide Films

Metal-stabilized bilayers, prepared by the self-assembly of octadecyltrichorosilane on an oxidized silicon surface followed by the Langmuir−Blodgett deposition of a monolayer of octadecylphosphonic acid, have been used to generate 1.6 nanometer thick, highly uniform, zirconium oxide films following...

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Bibliographic Details
Published in:ACS nano 2008-04, Vol.2 (4), p.643-650
Main Authors: Watson, Scott M. D, Coleman, Karl S, Chakraborty, Amit K
Format: Article
Language:English
Subjects:
Crystallization - methods
Macromolecular Substances - chemistry
Materials Testing
Membranes, Artificial
Molecular Conformation
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Organophosphonates - chemistry
Particle Size
Surface Properties
Zirconium - chemistry
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Summary:Metal-stabilized bilayers, prepared by the self-assembly of octadecyltrichorosilane on an oxidized silicon surface followed by the Langmuir−Blodgett deposition of a monolayer of octadecylphosphonic acid, have been used to generate 1.6 nanometer thick, highly uniform, zirconium oxide films following annealing. Patterning of the thin films on the nanometre scale was achieved using nanodisplacement methodology, by careful control of an atomic force microscope (AFM) probe, which allowed the selective removal of the upper leaflet of the bilayer.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn700138q