Traversing the “Top-Down/Bottom-Up” Divide: Molecular-Scale Lithography of Self-Assembled Ribbons

Use of graphitic (hexabenzocoronene-derived) molecules produces cholesteric ribbons which serve as molecular resists in a fluorine plasma. This procedure allows the shape of the molecular assemblies to be etched into the underlying silicon, validating the concept of “molecular resists”.

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Bibliographic Details
Published in:Journal of the American Chemical Society 2009-01, Vol.131 (2), p.398-399
Main Authors: Jarvholm, Jonas, Srinivasarao, Mohan, Tolbert, Laren M
Format: Article
Language:English
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Description
Summary:Use of graphitic (hexabenzocoronene-derived) molecules produces cholesteric ribbons which serve as molecular resists in a fluorine plasma. This procedure allows the shape of the molecular assemblies to be etched into the underlying silicon, validating the concept of “molecular resists”.
ISSN:0002-7863
1520-5126
DOI:10.1021/ja805319k