Mapping of Process-Induced Dopant Redistributions by Electron Holography

We present and review dopant mapping examples in semiconductor device structures by electron holography and outline their potential applications for experimental investigation of two-dimensional (2D) dopant diffusion on the nanometer scale. We address the technical challenges of the method when appl...

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Bibliographic Details
Published in:Microscopy and microanalysis 2004-08, Vol.10 (4), p.462-469
Main Authors: Rau, Wolf-Dieter, Orchowski, Alexander
Format: Article
Language:English
Subjects:
Boron
Boundary conditions
Changes
Electric fields
Fabrication
Holography
Materials Applications
Semiconductors
Transplants & implants
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Summary:We present and review dopant mapping examples in semiconductor device structures by electron holography and outline their potential applications for experimental investigation of two-dimensional (2D) dopant diffusion on the nanometer scale. We address the technical challenges of the method when applied to transistor structures with respect to quantification of the results in terms of the 2D p–n junction potential and critically review experimental boundary conditions, accuracy, and potential pitfalls. By obtaining maps of the inner electrostatic potential before and after anneals typically used in device processing, we demonstrate how the “vertical” and “lateral” redistribution of boron during device fabrication can directly be revealed. Such data can be compared with the results of process simulation to extract the fundamental parameters for dopant diffusion in complex device structures.
ISSN:1431-9276
1435-8115
DOI:10.1017/S1431927604040036