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The effect of annealing temperature on latex film dissolution
The steady-state fluorescence technique (SSF) was used to study the dissolution of polystyrene (PS) latex films in toluene. The main objective of this study was to explore the effects of annealing temperature on the dissolution behavior of the PS films. It has been shown that dissolution coefficient...
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| Published in: | Journal of colloid and interface science 2004-09, Vol.277 (2), p.359-365 |
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| Language: | English |
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| container_title | Journal of colloid and interface science |
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| creator | Uğur, Saziye Pekcan, Onder |
| description | The steady-state fluorescence technique (SSF) was used to study the dissolution of polystyrene (PS) latex films in toluene. The main objective of this study was to explore the effects of annealing temperature on the dissolution behavior of the PS films. It has been shown that dissolution coefficients of PS films are highly affected by the annealing temperatures. It was found that, while PS films dissolved as entangled clusters when annealed at low temperatures, they dissolved as individual chains at high annealing temperatures. The results showed that when the annealing temperature increases, the dissolution takes place in the disentanglement regime. The decrease in dissolution coefficients,
D
d, can be explained as a shift of dissolution from the entangled clusters regime to the disentanglement regime. The measured
D
d values were found to be in between 4.2 and 1.0×10
−10 cm
2
s
−1 for an annealing temperature range of 110–220
°C. |
| doi_str_mv | 10.1016/j.jcis.2004.04.040 |
| format | article |
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D
d, can be explained as a shift of dissolution from the entangled clusters regime to the disentanglement regime. The measured
D
d values were found to be in between 4.2 and 1.0×10
−10 cm
2
s
−1 for an annealing temperature range of 110–220
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D
d, can be explained as a shift of dissolution from the entangled clusters regime to the disentanglement regime. The measured
D
d values were found to be in between 4.2 and 1.0×10
−10 cm
2
s
−1 for an annealing temperature range of 110–220
°C.</description><subject>Annealing temperature</subject><subject>Chemistry</subject><subject>Dissolution</subject><subject>Exact sciences and technology</subject><subject>Fluorescence</subject><subject>General and physical chemistry</subject><subject>Latex - chemistry</subject><subject>Latex film</subject><subject>Particle Size</subject><subject>Polystyrenes - chemistry</subject><subject>Solubility</subject><subject>Surface Properties</subject><subject>Temperature</subject><subject>Time Factors</subject><subject>Toluene - chemistry</subject><issn>0021-9797</issn><issn>1095-7103</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMo7rr6BzxILnrrmqRp04IeZPELFrys55AmE03px5q0ov_edrfoTRiYy_O-MzwInVOypISm1-Wy1C4sGSF8uRtygOaU5EkkKIkP0ZwQRqNc5GKGTkIoCaE0SfJjNKNJzGnGxRzdbt4Bg7WgO9xarJoGVOWaN9xBvQWvut4DbhtcqQ6-sHVVjY0Loa36zrXNKTqyqgpwNu0Fen2436yeovXL4_Pqbh3pOGNdpG3KOWOmsNYQVWTGMJ4Jk1JuVKzywiqSCpLlVhhKTSaK2DARJ1AIzjOjeLxAV_verW8_egidrF3QUFWqgbYPMk2zOGH5CLI9qH0bggcrt97Vyn9LSuQoTZZylCZHaXI3ZAhdTO19UYP5i0yWBuByAlTQqrJeNWPHL5cOLZSP12_2HAwuPh14GbSDRoNxfhAsTev---MHq-6Khg</recordid><startdate>20040915</startdate><enddate>20040915</enddate><creator>Uğur, Saziye</creator><creator>Pekcan, Onder</creator><general>Elsevier Inc</general><general>Elsevier</general><scope>IQODW</scope><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20040915</creationdate><title>The effect of annealing temperature on latex film dissolution</title><author>Uğur, Saziye ; Pekcan, Onder</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c382t-cf64422dbffd0ab8dd2487d614da3a9bfa067089f7d11d87b3d2735eb7448da43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Annealing temperature</topic><topic>Chemistry</topic><topic>Dissolution</topic><topic>Exact sciences and technology</topic><topic>Fluorescence</topic><topic>General and physical chemistry</topic><topic>Latex - chemistry</topic><topic>Latex film</topic><topic>Particle Size</topic><topic>Polystyrenes - chemistry</topic><topic>Solubility</topic><topic>Surface Properties</topic><topic>Temperature</topic><topic>Time Factors</topic><topic>Toluene - chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Uğur, Saziye</creatorcontrib><creatorcontrib>Pekcan, Onder</creatorcontrib><collection>Pascal-Francis</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Journal of colloid and interface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Uğur, Saziye</au><au>Pekcan, Onder</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The effect of annealing temperature on latex film dissolution</atitle><jtitle>Journal of colloid and interface science</jtitle><addtitle>J Colloid Interface Sci</addtitle><date>2004-09-15</date><risdate>2004</risdate><volume>277</volume><issue>2</issue><spage>359</spage><epage>365</epage><pages>359-365</pages><issn>0021-9797</issn><eissn>1095-7103</eissn><coden>JCISA5</coden><abstract>The steady-state fluorescence technique (SSF) was used to study the dissolution of polystyrene (PS) latex films in toluene. The main objective of this study was to explore the effects of annealing temperature on the dissolution behavior of the PS films. It has been shown that dissolution coefficients of PS films are highly affected by the annealing temperatures. It was found that, while PS films dissolved as entangled clusters when annealed at low temperatures, they dissolved as individual chains at high annealing temperatures. The results showed that when the annealing temperature increases, the dissolution takes place in the disentanglement regime. The decrease in dissolution coefficients,
D
d, can be explained as a shift of dissolution from the entangled clusters regime to the disentanglement regime. The measured
D
d values were found to be in between 4.2 and 1.0×10
−10 cm
2
s
−1 for an annealing temperature range of 110–220
°C.</abstract><cop>San Diego, CA</cop><pub>Elsevier Inc</pub><pmid>15341847</pmid><doi>10.1016/j.jcis.2004.04.040</doi><tpages>7</tpages></addata></record> |
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| ispartof | Journal of colloid and interface science, 2004-09, Vol.277 (2), p.359-365 |
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| language | eng |
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| source | ScienceDirect Freedom Collection 2022-2024 |
| subjects | Annealing temperature Chemistry Dissolution Exact sciences and technology Fluorescence General and physical chemistry Latex - chemistry Latex film Particle Size Polystyrenes - chemistry Solubility Surface Properties Temperature Time Factors Toluene - chemistry |
| title | The effect of annealing temperature on latex film dissolution |
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