Coherent inelastic scattering in Si and TiAl

An image filter has been used to test a simple model describing the dynamical scattering of electrons that have suffered multiple interactions with plasmons. Semi-quantitative agreement is observed in both Si and TiAl under quasi two-beam conditions. In the latter material it is shown that the class...

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Bibliographic Details
Published in:Ultramicroscopy 2004-11, Vol.101 (2-4), p.247-255
Main Authors: Moodie, Alexander F., Colson, Tobias A., Whitfield, Harold J.
Format: Article
Language:English
Subjects:
Alloys - chemistry
Aluminum Compounds - chemistry
Coherent inelastic scattering
EELS
Electrons
Microscopy, Electron, Transmission
Models, Theoretical
Plasmon
Scattering, Radiation
Silicon - chemistry
Spectrum Analysis
TEM
Titanium - chemistry
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Summary:An image filter has been used to test a simple model describing the dynamical scattering of electrons that have suffered multiple interactions with plasmons. Semi-quantitative agreement is observed in both Si and TiAl under quasi two-beam conditions. In the latter material it is shown that the classical Hirsch, Howie, Whelan analysis of contrast due to dislocations can be carried out in images produced by electrons that have suffered as many as five interactions with plasmons and at thicknesses at which the unfiltered and zero loss images show no contrast.
ISSN:0304-3991
1879-2723
DOI:10.1016/j.ultramic.2004.06.006