Single Photon Emission from Site-Controlled InAs Quantum Dots Grown on GaAs(001) Patterned Substrates

We present a fabrication method to produce site-controlled and regularly spaced InAs/GaAs quantum dots for applications in quantum optical information devices. The high selectivity of our epitaxial regrowth procedure can be used to allocate the quantum dots only in positions predefined by ex-situ lo...

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Bibliographic Details
Published in:ACS nano 2009-06, Vol.3 (6), p.1513-1517
Main Authors: Martín-Sánchez, J, Muñoz-Matutano, G, Herranz, J, Canet-Ferrer, J, Alén, B, González, Y, Alonso-González, P, Fuster, D, González, L, Martínez-Pastor, J, Briones, F
Format: Article
Language:English
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Summary:We present a fabrication method to produce site-controlled and regularly spaced InAs/GaAs quantum dots for applications in quantum optical information devices. The high selectivity of our epitaxial regrowth procedure can be used to allocate the quantum dots only in positions predefined by ex-situ local oxidation atomic force nanolithography. The quantum dots obtained following this fabrication process present a high optical quality which we have evaluated by microphotoluminescence and photon correlation experiments.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn9001566