Fabrication of Large Number Density Platinum Nanowire Arrays by Size Reduction Lithography and Nanoimprint Lithography

Large number density Pt nanowires with typical dimensions of 12 μm × 20 nm × 5 nm (length × width × height) are fabricated on planar oxide supports. First sub-20 nm single crystalline silicon nanowires are fabricated by size reduction lithography, and then the Si nanowire pattern is replicated to pr...

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Bibliographic Details
Published in:Nano letters 2005-04, Vol.5 (4), p.745-748
Main Authors: Yan, X.-M, Kwon, S, Contreras, A. M, Bokor, J, Somorjai, G. A
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of nanofabrication
Nanolithography
Nanoscale materials and structures: fabrication and characterization
Physics
Quantum wires
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Summary:Large number density Pt nanowires with typical dimensions of 12 μm × 20 nm × 5 nm (length × width × height) are fabricated on planar oxide supports. First sub-20 nm single crystalline silicon nanowires are fabricated by size reduction lithography, and then the Si nanowire pattern is replicated to produce a large number of Pt nanowires by nanoimprint lithography. The width and height of the Pt nanowires are uniform and are controlled with nanometer precision. The nanowire number density is 4 × 104 cm-1, resulting in a Pt surface area larger than 2 cm2 on a 5 × 5 cm2 oxide substrate. Bimodal nanowires with different width have been generated by using a Pt shadow deposition technique. Using this technique, alternating 10 and 19 nm wide nanowires are produced.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl050228q