Film growth precursor development for metal nitrides. Synthesis, structure, and volatility of molybdenum(VI) and tungsten(VI) complexes containing bis(imido)metal fragments and various nitrogen donor ligands

• Published in: Dalton transactions : an international journal of inorganic chemistry 2006-01, Vol.2006 (16), p.1943-1953
• Main Authors: El-Kadri, Oussama M, Heeg, Mary Jane, Winter, Charles H
• Format: Article
• Language: English
• ISSN: 1477-9226; 0300-9246; 1477-9234
• DOI: 10.1039/b515378f

The molybdenum and tungsten complexes W2(NtBu)4(pz)4(pzH).(C6H14)0.5 (pz = pyrazolate), M(NtBu)2(Me2pz)2(Me2pzH)2 (Me2pz = 3,5-dimethylpyrazolate), M(NtBu)2(tBu2pz)2 (tBu2pz = 3,5-di-tert-butylpyrazolate), M2(NtBu)4(Me2pz)2Cl2, W(NtBu)2(C2N3(iPr)2)2py2, M(NtBu)2-(CN4CF3)2py2, and W(NtBu)2(PhNNNPh)2 were prepared by various synthetic routes from the starting materials Mo(NtBu)2Cl2, W(NtBu)2(NHtBu)2, and W(NtBu)2Cl2py2. These new complexes were characterized by spectral and analytical methods and by X-ray crystal structure determinations. The volatilities and thermal stabilities were evaluated to determine the potential of the new complexes for use in thin film growth of metal nitride films. Mo(NtBu)2(tBu2pz)2 and W(NtBu)2(tBu2pz)2 were found to have the optimum combination of volatility and thermal stability for application in atomic layer deposition thin film growth procedures.