Edge Transfer Lithography Using Alkanethiol Inks

Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a...

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Bibliographic Details
Published in:Nano letters 2006-06, Vol.6 (6), p.1235-1239
Main Authors: Sharpe, Ruben B. A, Titulaer, Bram J. F, Peeters, Emiel, Burdinski, Dirk, Huskens, Jurriaan, Zandvliet, Harold J. W, Reinhoudt, David N, Poelsema, Bene
Format: Article
Language:English
Subjects:
Alkanes - chemistry
Applied sciences
Electronics
Exact sciences and technology
Gold - chemistry
Ink
Materials Testing
Microelectronic fabrication (materials and surfaces technology)
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Particle Size
Printing - methods
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Sulfhydryl Compounds - chemistry
Surface Properties
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Summary:Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl0607885