Massively Parallel Dip-Pen Nanolithography with 55 000-Pen Two-Dimensional Arrays

Lots of writing on the wall: A simple and flexible approach for performing high‐throughput, large‐area, direct‐write molecular patterning, without tip feedback, is demonstrated by using a 55 000‐pen two‐dimensional array of atomic force microscope (AFM) cantilevers. The use of low‐aspect‐ratio pyram...

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Bibliographic Details
Published in:Angewandte Chemie International Edition 2006-11, Vol.45 (43), p.7220-7223
Main Authors: Salaita, Khalid, Wang, Yuhuang, Fragala, Joseph, Vega, Rafael A., Liu, Chang, Mirkin, Chad A.
Format: Article
Language:English
Subjects:
dip-pen nanolithography
Equipment Design
Gold - chemistry
lithography
nanofabrication
Nanotechnology - instrumentation
Nanotechnology - methods
parallelization
Particle Size
scanning probe
Surface Properties
Tin - chemistry
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Summary:Lots of writing on the wall: A simple and flexible approach for performing high‐throughput, large‐area, direct‐write molecular patterning, without tip feedback, is demonstrated by using a 55 000‐pen two‐dimensional array of atomic force microscope (AFM) cantilevers. The use of low‐aspect‐ratio pyramidal tips, curved cantilevers, and a novel gravity‐driven alignment method allows parallel patterning of molecules across 1‐cm2 substrate areas at sub‐100‐nm resolution.
ISSN:1433-7851
1521-3773
DOI:10.1002/anie.200603142