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Massively Parallel Dip-Pen Nanolithography with 55 000-Pen Two-Dimensional Arrays
Lots of writing on the wall: A simple and flexible approach for performing high‐throughput, large‐area, direct‐write molecular patterning, without tip feedback, is demonstrated by using a 55 000‐pen two‐dimensional array of atomic force microscope (AFM) cantilevers. The use of low‐aspect‐ratio pyram...
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Published in: | Angewandte Chemie International Edition 2006-11, Vol.45 (43), p.7220-7223 |
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creator | Salaita, Khalid Wang, Yuhuang Fragala, Joseph Vega, Rafael A. Liu, Chang Mirkin, Chad A. |
description | Lots of writing on the wall: A simple and flexible approach for performing high‐throughput, large‐area, direct‐write molecular patterning, without tip feedback, is demonstrated by using a 55 000‐pen two‐dimensional array of atomic force microscope (AFM) cantilevers. The use of low‐aspect‐ratio pyramidal tips, curved cantilevers, and a novel gravity‐driven alignment method allows parallel patterning of molecules across 1‐cm2 substrate areas at sub‐100‐nm resolution. |
doi_str_mv | 10.1002/anie.200603142 |
format | article |
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subjects | dip-pen nanolithography Equipment Design Gold - chemistry lithography nanofabrication Nanotechnology - instrumentation Nanotechnology - methods parallelization Particle Size scanning probe Surface Properties Tin - chemistry |
title | Massively Parallel Dip-Pen Nanolithography with 55 000-Pen Two-Dimensional Arrays |
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