Fluorinated Organic−Inorganic Hybrid Mold as a New Stamp for Nanoimprint and Soft Lithography

In this paper, we fabricated a fluorinated organic−inorganic hybrid mold using a nonhydrolytic sol−gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecul...

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Bibliographic Details
Published in:Langmuir 2005-10, Vol.21 (21), p.9390-9392
Main Authors: Choi, Dae-Geun, Jeong, Jun-ho, Sim, Young-suk, Lee, Eung-sug, Kim, Woo-Soo, Bae, Byeong-Soo
Format: Article
Language:English
Subjects:
Chemistry
Colloidal gels. Colloidal sols
Colloidal state and disperse state
Exact sciences and technology
General and physical chemistry
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Summary:In this paper, we fabricated a fluorinated organic−inorganic hybrid mold using a nonhydrolytic sol−gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 °C. The hybrid mold produced from UV nanoimprint lithography (UV−NIL) was used as a mold for the next UV−NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.
ISSN:0743-7463
1520-5827
DOI:10.1021/la0513205