A self-propagating system for Ge incorporation into nanostructured silica

Technologically-relevant levels of Ge can be incorporated into cell wall silica of the diatom Thalassiosira pseudonana with no aberration in structure at low levels, whereas higher levels alter structure.

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2008-01 (37), p.4495-4497
Main Authors: Davis, Aubrey K, Hildebrand, Mark
Format: Article
Language:English
Subjects:
Diatoms - chemistry
Germanium - chemistry
Microscopy, Electron, Scanning
Nanostructures
Silicon Dioxide - chemistry
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Description
Summary:Technologically-relevant levels of Ge can be incorporated into cell wall silica of the diatom Thalassiosira pseudonana with no aberration in structure at low levels, whereas higher levels alter structure.
ISSN:1359-7345
1364-548X
DOI:10.1039/b804955f