Photolithographic generation of protein micropatterns for neuron culture applications

Standard positive photoresist techniques were adapted to generate micropatterns of proteins on glass and oxide surfaces. Both lift-off and plasma-etching techniques were used to transfer the photoresist pattern into a layer of covalently immobilised protein. The surface properties of the areas adjac...

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Bibliographic Details
Published in:Biomaterials 2002-02, Vol.23 (3), p.893-900
Main Authors: Sorribas, Helga, Padeste, Celestino, Tiefenauer, Louis
Format: Article
Language:English
Subjects:
Animals
Biochemical engineering
Cell Adhesion Molecules, Neuronal
Cell Culture Techniques - methods
Chick Embryo
Contactin 2
Ganglia, Spinal - cytology
Glass
Immunoglobulin G
Neuronal networks
Neurons - cytology
Oligopeptides
Photolithography
Photoresists
Plasma etching
Protein pattern
Rabbits
Streptavidin
Surface Properties
Tissue culture
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Summary:Standard positive photoresist techniques were adapted to generate micropatterns of proteins on glass and oxide surfaces. Both lift-off and plasma-etching techniques were used to transfer the photoresist pattern into a layer of covalently immobilised protein. The surface properties of the areas adjacent to the patterns were altered by chemical surface modification. Using a combination of the lift-off and the etching process complementary patterns of two different proteins were generated. The biochemical and biological functionality of the protein patterns were assessed by immunostaining and by investigating the outgrowth of neurites from neurons plated on the patterned substrates. The investigated patterning processes are compatible with microstructuring and thin film processes, and may be used to generate functional surfaces for sensor and neuron culture applications.
ISSN:0142-9612
1878-5905
DOI:10.1016/S0142-9612(01)00199-5