Relative measurements of second-order susceptibility with reflective second-harmonic generation

There is a strong demand for a simple and reliable technique for second-order susceptibility measurements of thin films. Since the Maker fringe technique is limited to transparent substrates we propose an experimental protocol based on reflective second-harmonic generation (SHG). The proposed protoc...

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Bibliographic Details
Published in:Applied optics (2004) 2003-11, Vol.42 (33), p.6666-6671
Main Authors: Flueraru, Costel, Grover, Chander P
Format: Article
Language:English
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Summary:There is a strong demand for a simple and reliable technique for second-order susceptibility measurements of thin films. Since the Maker fringe technique is limited to transparent substrates we propose an experimental protocol based on reflective second-harmonic generation (SHG). The proposed protocol is based on relative measurements of Z-cut quartz. An analytical expression of the reflective SHG intensity dependence of the polarizer, analyzer, and sample azimuth is presented. An error analysis is also presented. Thin organic film of the side-chain polymer poly(Disperse Red 1 Methacrylate-Co-Methyl-Methacrylate) is investigated. Results for different wavelengths are reported.
ISSN:1559-128X
DOI:10.1364/AO.42.006666