Electron-beam deposited boron coatings for the extreme ultraviolet

Boron films deposited by evaporation with an electron-beam were found to have a relatively high reflectance in the extreme ultraviolet with values similar to those of ion-beam-sputtered (IBS) SiC and IBS B(4)C. The largest reflectance was measured for an 11 nm thick boron film. Some reflectance degr...

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Bibliographic Details
Published in:Applied optics (2004) 2008-06, Vol.47 (16), p.2926-2930
Main Authors: Vidal-Dasilva, Manuela, Fernández-Perea, Mónica, Méndez, José A, Aznárez, José A, Larruquert, Juan I
Format: Article
Language:English
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Summary:Boron films deposited by evaporation with an electron-beam were found to have a relatively high reflectance in the extreme ultraviolet with values similar to those of ion-beam-sputtered (IBS) SiC and IBS B(4)C. The largest reflectance was measured for an 11 nm thick boron film. Some reflectance degradation was observed for boron films stored in a desiccator. Reflectance degradation varied from sample to sample and was found to be either similar to that of IBS SiC and IBS B(4)C or larger.
ISSN:1559-128X
DOI:10.1364/AO.47.002926