Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieve...

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Bibliographic Details
Published in:Applied optics (2004) 2002-06, Vol.41 (16), p.3262-3269
Main Authors: Montcalm, Claude, Grabner, R Frederick, Hudyma, Russell M, Schmidt, Mark A, Spiller, Eberhard, Walton, Christopher C, Wedowski, Marco, Folta, James A
Format: Article
Language:English
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Summary:We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within +/-0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions.
ISSN:1559-128X
DOI:10.1364/AO.41.003262