Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement

The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. R...

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Bibliographic Details
Published in:Applied optics (2004) 2002-06, Vol.41 (16), p.3248-3255
Main Authors: Otani, Minoru, Biro, Ryuji, Ouchi, Chidane, Hasegawa, Masanobu, Suzuki, Yasuyuki, Sone, Kazuho, Niisaka, Shunsuke, Saito, Tadahiko, Saito, Jun, Tanaka, Akira, Matsumoto, Akira
Format: Article
Language:English
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Summary:The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. Reflectance, absorption, and scatter of AR coatings were measured with these apparatuses. The AR coating samples were supplied by Japanese vendors. Each AR coating as supplied was coated with the vendor's coating design by that vendor's coating process. Our measurement apparatuses, methods, and results for these AR coatings are presented here.
ISSN:1559-128X
DOI:10.1364/ao.41.003248