Modification of diamond single crystals by chromium ion implantation with sacrificial layers

Single-crystal diamond surfaces were implanted with chromium ions. Ion energies chosen were 120 and 180 keV. Ion doses of 1x10(17) cm(-2) were applied at a substrate temperature of 750 degrees C. Reduced lattice damage could be obtained by deposition of a titanium sacrificial layer with a thickness...

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Bibliographic Details
Published in:Analytical and bioanalytical chemistry 2002-12, Vol.374 (7-8), p.1335-1337
Main Authors: Stock, H-R, Kohlscheen, J, Mayr, P
Format: Article
Language:English
Subjects:
Chromium
Crystals
Damage
Depth profiling
Diamonds
Infrared spectroscopy
Ion implantation
Photoelectron spectroscopy
Photoelectrons
Single crystals
Substrates
Thickness
Titanium
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Summary:Single-crystal diamond surfaces were implanted with chromium ions. Ion energies chosen were 120 and 180 keV. Ion doses of 1x10(17) cm(-2) were applied at a substrate temperature of 750 degrees C. Reduced lattice damage could be obtained by deposition of a titanium sacrificial layer with a thickness of 10 and 50 nm before implantation. Depth profiles of the elemental binding states were taken by photoelectron spectroscopy. The effect of the sacrificial layer thickness on diamond lattice damage was investigated by infrared spectroscopy.
ISSN:1618-2642
1618-2650
DOI:10.1007/s00216-002-1589-z