Modeling material saturation effects in microholographic recording

Microholographic data storage system model is presented that includes non-linear and non-local behavior of the storage material for accurate simulation of the system and optimization of the writing process. For the description of the photopolymer material a diffusion based nonlocal material model is...

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Bibliographic Details
Published in:Optics express 2007-02, Vol.15 (4), p.1732-1737
Main Authors: Nagy, Zs, Koppa, P, Ujhelyi, F, Dietz, E, Frohmann, S, Orlic, S
Format: Article
Language:English
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Summary:Microholographic data storage system model is presented that includes non-linear and non-local behavior of the storage material for accurate simulation of the system and optimization of the writing process. For the description of the photopolymer material a diffusion based nonlocal material model is used. The diffusion equation is solved numerically and the modulation of the dielectric constant is calculated. Diffraction efficiency of simulated microholograms and measurements were compared, and they show good agreement.
ISSN:1094-4087
1094-4087
DOI:10.1364/oe.15.001732