Computational method for determining n and k for a thin film from the measured reflectance, transmittance, and film thickness

A computational method of determining n and k for an evaporated film from the measured reflectance, transmittance, and film thickness has been programmed for an IBM 7094 computer. The method consists of modifications to the NOTS multilayer film program. The basic program computes normal incidence re...

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Bibliographic Details
Published in:Applied optics (2004) 1966-01, Vol.5 (1), p.41-43
Main Authors: Bennett, J M, Booty, M J
Format: Article
Language:English
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Summary:A computational method of determining n and k for an evaporated film from the measured reflectance, transmittance, and film thickness has been programmed for an IBM 7094 computer. The method consists of modifications to the NOTS multilayer film program. The basic program computes normal incidence reflectance, transmittance, phase change on reflection, and other parameters from the optical constants and thicknesses of all materials. In the modification, n and k for the film are varied in a prescribed manner, and the computer picks from among these values one n and one k which yield reflectance and transmittance values almost equalling the measured values. Results are given for films of silicon and aluminum.
ISSN:1559-128X
DOI:10.1364/AO.5.000041