Thickness measurement using Young's interferometric experiment

The paper describes an interferometer for use in the thickness determination of optical thin films. The standard deviation obtained by repeated measurements is of the order of 0.3 nm. In those measurements, the thickness is obtained as a fraction of the applied wavelength, which consequently acts as...

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Bibliographic Details
Published in:Applied optics (2004) 1988-09, Vol.27 (18), p.3869-3874
Main Authors: van der Laan, C J, Frankena, H J
Format: Article
Language:English
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Summary:The paper describes an interferometer for use in the thickness determination of optical thin films. The standard deviation obtained by repeated measurements is of the order of 0.3 nm. In those measurements, the thickness is obtained as a fraction of the applied wavelength, which consequently acts as the unit of length. The method does not require a layer of known thickness for calibration.
ISSN:1559-128X
DOI:10.1364/AO.27.003869