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Layer uniformity obtained by vacuum evaporation: application to Fabry-Perot filters
We show how we can measure with accuracy the distribution law of thicknesses deposited inside a vacuum chamber. These measurement techniques are applied to the simultaneous production of high rejection narrowband multiple halfwave Fabry-Perot filters. To prevent any alteration of the filters' o...
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Published in: | Applied optics (2004) 1989-07, Vol.28 (14), p.2960-2964 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that cite this one |
Online Access: | Get full text |
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Summary: | We show how we can measure with accuracy the distribution law of thicknesses deposited inside a vacuum chamber. These measurement techniques are applied to the simultaneous production of high rejection narrowband multiple halfwave Fabry-Perot filters. To prevent any alteration of the filters' optical properties, we must control the variations vs time of the evaporant distribution. |
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ISSN: | 1559-128X |
DOI: | 10.1364/ao.28.002960 |