Comparison between electrical and free space optical interconnects for fine grain processor arrays based on interconnect density capabilities

Optically interconnected processor arrays are compared to conventional fully electronic processor arrays in terms of interconnect density capabilities. A complexity model is introduced that allows the calculation of the array area growth rate as an asymptotic function of the number of processing ele...

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Published in:Applied optics (2004) 1989-09, Vol.28 (18), p.3820-3829
Main Authors: Feldman, M R, Guest, C C, Drabik, T J, Esener, S C
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Language:English
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container_issue 18
container_start_page 3820
container_title Applied optics (2004)
container_volume 28
creator Feldman, M R
Guest, C C
Drabik, T J
Esener, S C
description Optically interconnected processor arrays are compared to conventional fully electronic processor arrays in terms of interconnect density capabilities. A complexity model is introduced that allows the calculation of the array area growth rate as an asymptotic function of the number of processing elements in the array Lower bounds on the area growth rate of electrically interconnected processor arrays are compared to upper bounds for free-space optically interconnected circuits that employ computer generated holograms. Results indicate that for connection networks such as the hypercube, perfect shuffle and crossbar networks, that have a high minimum bisection width (a measure of the global nature of an interconnect topology) and contain some degree of spatial invariance, optically interconnected circuit area growth rates are below lower bounds on VLSI circuit growth rates.
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fullrecord <record><control><sourceid>proquest_pubme</sourceid><recordid>TN_cdi_proquest_miscellaneous_733351623</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>733351623</sourcerecordid><originalsourceid>FETCH-LOGICAL-c417t-e31d4e88ab610522cf6946381ff715f7b7d16322f46f3fc16ec98d0a4f5aece03</originalsourceid><addsrcrecordid>eNpNkE1Lw0AQhveg2Fq9eZa9eUrd76THUvyCQi8K3sJkMysrySbubpH-CP-zQSt4Gnh4Zt6XIeSKsyWXRt2ud0tRLRmTlWAnZM61XhVcVK8zcp7S-8S1WpVnZCaY1rqs1Jx8bYZ-hOjTEGiD-RMxUOzQ5ugtdBRCS11EpGkEi3QY8w_2IWO0QwiTmKgbInU-IH2L4AMd42AxpQlCjHBItIGELZ0C_q_RFkPy-UAtjND4zmeP6YKcOugSXh7ngrzc3z1vHovt7uFps94WVvEyFyh5q7CqoDGcaSGsMytlZMWdK7l2ZVO23EghnDJOOssN2lXVMlBOA1pkckFufu9OXT_2mHLd-2Sx6yDgsE91KaXU3Ag5mddHc9_02NZj9D3EQ_33QfkNDYF0Qg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>733351623</pqid></control><display><type>article</type><title>Comparison between electrical and free space optical interconnects for fine grain processor arrays based on interconnect density capabilities</title><source>OSA_美国光学学会数据库1</source><creator>Feldman, M R ; Guest, C C ; Drabik, T J ; Esener, S C</creator><creatorcontrib>Feldman, M R ; Guest, C C ; Drabik, T J ; Esener, S C</creatorcontrib><description>Optically interconnected processor arrays are compared to conventional fully electronic processor arrays in terms of interconnect density capabilities. A complexity model is introduced that allows the calculation of the array area growth rate as an asymptotic function of the number of processing elements in the array Lower bounds on the area growth rate of electrically interconnected processor arrays are compared to upper bounds for free-space optically interconnected circuits that employ computer generated holograms. Results indicate that for connection networks such as the hypercube, perfect shuffle and crossbar networks, that have a high minimum bisection width (a measure of the global nature of an interconnect topology) and contain some degree of spatial invariance, optically interconnected circuit area growth rates are below lower bounds on VLSI circuit growth rates.</description><identifier>ISSN: 1559-128X</identifier><identifier>DOI: 10.1364/AO.28.003820</identifier><identifier>PMID: 20555784</identifier><language>eng</language><publisher>United States</publisher><ispartof>Applied optics (2004), 1989-09, Vol.28 (18), p.3820-3829</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c417t-e31d4e88ab610522cf6946381ff715f7b7d16322f46f3fc16ec98d0a4f5aece03</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27922,27923</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/20555784$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Feldman, M R</creatorcontrib><creatorcontrib>Guest, C C</creatorcontrib><creatorcontrib>Drabik, T J</creatorcontrib><creatorcontrib>Esener, S C</creatorcontrib><title>Comparison between electrical and free space optical interconnects for fine grain processor arrays based on interconnect density capabilities</title><title>Applied optics (2004)</title><addtitle>Appl Opt</addtitle><description>Optically interconnected processor arrays are compared to conventional fully electronic processor arrays in terms of interconnect density capabilities. A complexity model is introduced that allows the calculation of the array area growth rate as an asymptotic function of the number of processing elements in the array Lower bounds on the area growth rate of electrically interconnected processor arrays are compared to upper bounds for free-space optically interconnected circuits that employ computer generated holograms. Results indicate that for connection networks such as the hypercube, perfect shuffle and crossbar networks, that have a high minimum bisection width (a measure of the global nature of an interconnect topology) and contain some degree of spatial invariance, optically interconnected circuit area growth rates are below lower bounds on VLSI circuit growth rates.</description><issn>1559-128X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1989</creationdate><recordtype>article</recordtype><recordid>eNpNkE1Lw0AQhveg2Fq9eZa9eUrd76THUvyCQi8K3sJkMysrySbubpH-CP-zQSt4Gnh4Zt6XIeSKsyWXRt2ud0tRLRmTlWAnZM61XhVcVK8zcp7S-8S1WpVnZCaY1rqs1Jx8bYZ-hOjTEGiD-RMxUOzQ5ugtdBRCS11EpGkEi3QY8w_2IWO0QwiTmKgbInU-IH2L4AMd42AxpQlCjHBItIGELZ0C_q_RFkPy-UAtjND4zmeP6YKcOugSXh7ngrzc3z1vHovt7uFps94WVvEyFyh5q7CqoDGcaSGsMytlZMWdK7l2ZVO23EghnDJOOssN2lXVMlBOA1pkckFufu9OXT_2mHLd-2Sx6yDgsE91KaXU3Ag5mddHc9_02NZj9D3EQ_33QfkNDYF0Qg</recordid><startdate>19890915</startdate><enddate>19890915</enddate><creator>Feldman, M R</creator><creator>Guest, C C</creator><creator>Drabik, T J</creator><creator>Esener, S C</creator><scope>NPM</scope><scope>7X8</scope></search><sort><creationdate>19890915</creationdate><title>Comparison between electrical and free space optical interconnects for fine grain processor arrays based on interconnect density capabilities</title><author>Feldman, M R ; Guest, C C ; Drabik, T J ; Esener, S C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c417t-e31d4e88ab610522cf6946381ff715f7b7d16322f46f3fc16ec98d0a4f5aece03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1989</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Feldman, M R</creatorcontrib><creatorcontrib>Guest, C C</creatorcontrib><creatorcontrib>Drabik, T J</creatorcontrib><creatorcontrib>Esener, S C</creatorcontrib><collection>PubMed</collection><collection>MEDLINE - Academic</collection><jtitle>Applied optics (2004)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Feldman, M R</au><au>Guest, C C</au><au>Drabik, T J</au><au>Esener, S C</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison between electrical and free space optical interconnects for fine grain processor arrays based on interconnect density capabilities</atitle><jtitle>Applied optics (2004)</jtitle><addtitle>Appl Opt</addtitle><date>1989-09-15</date><risdate>1989</risdate><volume>28</volume><issue>18</issue><spage>3820</spage><epage>3829</epage><pages>3820-3829</pages><issn>1559-128X</issn><abstract>Optically interconnected processor arrays are compared to conventional fully electronic processor arrays in terms of interconnect density capabilities. A complexity model is introduced that allows the calculation of the array area growth rate as an asymptotic function of the number of processing elements in the array Lower bounds on the area growth rate of electrically interconnected processor arrays are compared to upper bounds for free-space optically interconnected circuits that employ computer generated holograms. Results indicate that for connection networks such as the hypercube, perfect shuffle and crossbar networks, that have a high minimum bisection width (a measure of the global nature of an interconnect topology) and contain some degree of spatial invariance, optically interconnected circuit area growth rates are below lower bounds on VLSI circuit growth rates.</abstract><cop>United States</cop><pmid>20555784</pmid><doi>10.1364/AO.28.003820</doi><tpages>10</tpages></addata></record>
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title Comparison between electrical and free space optical interconnects for fine grain processor arrays based on interconnect density capabilities
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T13%3A08%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pubme&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Comparison%20between%20electrical%20and%20free%20space%20optical%20interconnects%20for%20fine%20grain%20processor%20arrays%20based%20on%20interconnect%20density%20capabilities&rft.jtitle=Applied%20optics%20(2004)&rft.au=Feldman,%20M%20R&rft.date=1989-09-15&rft.volume=28&rft.issue=18&rft.spage=3820&rft.epage=3829&rft.pages=3820-3829&rft.issn=1559-128X&rft_id=info:doi/10.1364/AO.28.003820&rft_dat=%3Cproquest_pubme%3E733351623%3C/proquest_pubme%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c417t-e31d4e88ab610522cf6946381ff715f7b7d16322f46f3fc16ec98d0a4f5aece03%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=733351623&rft_id=info:pmid/20555784&rfr_iscdi=true