Test of opticlean strip coating material for removing surface contamination

The strip coating material, Opticlean, which has been reformulated, has been shown to remove 1-5-microm-diameter particles as well as contamination remaining from previous drag wipe cleaning on a used silicon wafer. In addition, no residue that produced scattering was found on a fresh silicon wafer...

Full description

Saved in:
Bibliographic Details
Published in:Applied optics (2004) 2000-06, Vol.39 (16), p.2737-2739
Main Authors: Bennett, J M, Rönnow, D
Format: Article
Language:English
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The strip coating material, Opticlean, which has been reformulated, has been shown to remove 1-5-microm-diameter particles as well as contamination remaining from previous drag wipe cleaning on a used silicon wafer. In addition, no residue that produced scattering was found on a fresh silicon wafer when Opticlean was applied and then stripped off. The total integrated scattering technique used for the measurements could measure scattering levels of He-Ne laser light as low as a few ppm (parts in 10(6)), corresponding to a surface roughness of
ISSN:1559-128X
DOI:10.1364/AO.39.002737