Edge-differentiating deposition of Co on SiO(2)-supported MoS(2) particles

The chemical vapor deposition of Co(CO)(3)NO under controlled conditions onto MoS(2) catalysts supported on SiO(2) achieves the edge-differentiating deposition of Co between (1010) and (1010) edges of MoS(2) particles, the former edge being preferentially decorated by Co at a low Co content to form...

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2010-04, Vol.46 (16), p.2748-2750
Main Authors: Okamoto, Yasuaki, Tamura, Kenta, Kubota, Takeshi
Format: Article
Language:English
Online Access:Get full text
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Summary:The chemical vapor deposition of Co(CO)(3)NO under controlled conditions onto MoS(2) catalysts supported on SiO(2) achieves the edge-differentiating deposition of Co between (1010) and (1010) edges of MoS(2) particles, the former edge being preferentially decorated by Co at a low Co content to form a catalytically "active" structure for hydrodesulfurization.
ISSN:1364-548X
DOI:10.1039/b924925g