Determination of hafnium in air dust filters by inductively coupled plasma atomic emission spectrometry

The procedure of hafnium determination in workplace air has been elaborated, which allows its determination at the level starting from 0.125 mg m −3, which for a 400 1 sample corresponds to the requirement for maximal allowable concentration. The method is based on excitation of the mineralized filt...

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Bibliographic Details
Published in:Talanta (Oxford) 1997-07, Vol.44 (7), p.1159-1162
Main Authors: Hulanicki, Adam, Surgiewicz, Jolanta, Jaron, Irena
Format: Article
Language:English
Subjects:
Air analysis
Applied sciences
Atmospheric pollution
Atomic emission spectrometry
Exact sciences and technology
Hafnium
Indoor pollution and occupational exposure
Inductively coupled plasma
Pollution
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Summary:The procedure of hafnium determination in workplace air has been elaborated, which allows its determination at the level starting from 0.125 mg m −3, which for a 400 1 sample corresponds to the requirement for maximal allowable concentration. The method is based on excitation of the mineralized filter containing the analyte in inductively coupled plasma.
ISSN:0039-9140
1873-3573
DOI:10.1016/S0039-9140(96)02152-2