Fabrication of concave silicon micro-mirrors

We have fabricated spherical and cylindrical concave micro-mirrors in silicon with dimensions from 20 microm to 100 microm. The fabrication process involves standard photolithography followed by large area ion beam irradiation and electrochemical anodisation in a HF electrolyte. After thermal oxidat...

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Bibliographic Details
Published in:Optics express 2010-07, Vol.18 (14), p.14511-14518
Main Authors: Ow, Yueh Sheng, Breese, Mark B H, Azimi, Sara
Format: Article
Language:English
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Summary:We have fabricated spherical and cylindrical concave micro-mirrors in silicon with dimensions from 20 microm to 100 microm. The fabrication process involves standard photolithography followed by large area ion beam irradiation and electrochemical anodisation in a HF electrolyte. After thermal oxidation the silicon surface roughness is less than 2 nm. We also present a multilayer porous silicon distributed Bragg reflector fabricated on concave silicon surfaces which selectively reflect and focus a band of wavelengths from a parallel beam of incident white light. Development of such low roughness concave microstructures opens up new applications in areas such as silicon photonics and quantum information science.
ISSN:1094-4087
1094-4087
DOI:10.1364/oe.18.014511