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Measurement of ultrafast optical nonlinearities using a modified Sagnac interferometer

A method for the measurement of fast, intensity-dependent refractive-index changes with the use of a modified Sagnac ring interferometer is presented. The measurement is not degraded by slowly responding background index changes. Nonlinear refractive-index changes in an undoped silicon wafer, and in...

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Bibliographic Details
Published in:Optics letters 1991-09, Vol.16 (17), p.1334-1336
Main Authors: GABRIEL, M. C, WHITAKER, N. A, DIRK, C. W, KUZYK, M. G, THAKUR, M
Format: Article
Language:English
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Summary:A method for the measurement of fast, intensity-dependent refractive-index changes with the use of a modified Sagnac ring interferometer is presented. The measurement is not degraded by slowly responding background index changes. Nonlinear refractive-index changes in an undoped silicon wafer, and in poly-bis toluene sulfonate polydiacetylene and dye-doped polymethyl methacrylate waveguides, were measured with the use of a cw mode-locked Nd:YAG laser.
ISSN:0146-9592
1539-4794
DOI:10.1364/ol.16.001334