High-resolution x-ray lithography using a phase mask

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Bibliographic Details
Published in:Applied optics (2004) 1986-03, Vol.25 (6), p.928-928
Main Authors: Yamakoshi, Y, Atoda, N, Shimizu, K, Sato, T, Shimizu, Y
Format: Article
Language:English
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ISSN:1559-128X
DOI:10.1364/ao.25.000928