Diffractive optical element designed by use of an irregular etching-depth sequence

In fabricating a diffractive optical element the ratio of the etching depth between the (n - 1)th and the nth mask is usually 1/2. We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1/2) is not kept constant. For achieving...

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Bibliographic Details
Published in:Applied optics (2004) 2001-11, Vol.40 (32), p.5894-5897
Main Authors: Kuo, C J, Chien, H C, Chang, N Y, Yeh, C H
Format: Article
Language:English
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Summary:In fabricating a diffractive optical element the ratio of the etching depth between the (n - 1)th and the nth mask is usually 1/2. We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1/2) is not kept constant. For achieving this improvement the difference between the desired and the actual diffraction pattern is also used as an objective function for phase quantization.
ISSN:1559-128X
DOI:10.1364/AO.40.005894