Cost-effective cleaning and high-quality thin gate oxides

Some recent findings in the area of wafer cleaning and thin oxide properties are presented in this paper. Results are shown for a practical implementation of a simplified cleaning concept that combines excellent performance in terms of metal and particle removal with low chemical and DI-water consum...

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Bibliographic Details
Published in:IBM journal of research and development 1999-05, Vol.43 (3), p.339-350
Main Authors: Heyns, M. M., Bearda, T., Cornelissen, I., DeGendt, S., Degraeve, R., Groeseneken, G., Kenens, C., Knotter, D. M., Loewenstein, L. M., Mertens, P. W., Mertens, S., Meuris, M., Nigam, T., Schaekers, M., Teerlinck, I., Vandervorst, W., Vos, R., Wolke, K.
Format: Article
Language:English
Subjects:
Chloride
Cleaning
Copper
Cost control
Costs
Efficiency
R&D
Research & development
Semiconductors
Sulfur
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Description
Summary:Some recent findings in the area of wafer cleaning and thin oxide properties are presented in this paper. Results are shown for a practical implementation of a simplified cleaning concept that combines excellent performance in terms of metal and particle removal with low chemical and DI-water consumption.
ISSN:0018-8646
0018-8646
2151-8556
DOI:10.1147/rd.433.0339