Advanced Capacitance Metrology for Nanoelectronic Device Characterization

We designed and fabricated a test chip (consisting of an array of metal-oxide-semiconductor (MOS) capacitors and metal-insulator-metal (MIM) capacitors ranging from 0.3 fF to 1.2 pF) for use in evaluating the performance of new measurement approaches for small capacitances. The complete array of cap...

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Bibliographic Details
Main Authors: Richter, Curt A, Kopanski, Joseph J, Jiang, Chong, Wang, Yicheng, Afridi, M Yaqub, Zhu, Xiaoxiao, Ioannou, D E, Li, Qiliang
Format: Conference Proceeding
Language:English
Online Access:Get full text
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Summary:We designed and fabricated a test chip (consisting of an array of metal-oxide-semiconductor (MOS) capacitors and metal-insulator-metal (MIM) capacitors ranging from 0.3 fF to 1.2 pF) for use in evaluating the performance of new measurement approaches for small capacitances. The complete array of capacitances was measured to obtain a 'fingerprint' of capacitance values. After correcting these data for pad and other stray capacitances, such data can be used to evaluate the relative accuracy and sensitivity of a capacitance measurement instrument or circuit. This test chip was used to assess the capabilities of two different capacitance measurement approaches: an LCR meter, and a capacitance bridge. A silicon-nanowire based capacitance test structure was fabricated and characterized by using the optimized capacitance measurement methods developed with the MOS/MIM test chip.
ISSN:0094-243X
DOI:10.1063/1.3251244