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Fabrication and Characterization of MOVPE-Grown CdTe-on-Si Heterojunction Diode-Type Gamma-Ray Detectors
We report on the growth of very thick (>260 μ m) high-crystalline-quality single-crystal CdTe epitaxial films on (211) Si substrates in a metalorganic vapor-phase epitaxy reactor, and the development of gamma ray detectors and their radiation detection properties. Films were grown with a high gr...
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Published in: | Journal of electronic materials 2008-09, Vol.37 (9), p.1391-1395 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We report on the growth of very thick (>260
μ
m) high-crystalline-quality single-crystal CdTe epitaxial films on (211) Si substrates in a metalorganic vapor-phase epitaxy reactor, and the development of gamma ray detectors and their radiation detection properties. Films were grown with a high growth rate varying from 40
μ
m/h to 70
μ
m/h. A heterojunction diode was fabricated by growing a 90-
μ
m-thick CdTe layer on an
n
+
-Si substrate, which exhibited good rectifying behavior and had a low reverse bias leakage current of 0.18
μ
A/cm
2
at 100 V bias. The diode clearly demonstrated its gamma radiation detection capability by resolving energy peaks from the
241
Am radioisotope during room-temperature measurements. By cooling the diode detector to −30°C, the leakage current could be reduced by three orders of magnitude from the room-temperature value. At this operating condition dramatic improvements in the pulse height spectrum were observed. |
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ISSN: | 0361-5235 1543-186X |
DOI: | 10.1007/s11664-008-0430-7 |