Ultra-Low Thermal Conductivity in W/Alsub 2 sub sub 3 Nanolaminates

Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Alsub 2 sub sub 3. With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of ~0.6 w...

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Bibliographic Details
Published in:Science (American Association for the Advancement of Science) 2004-02, Vol.303 (5660), p.989-990
Main Authors: Costescu, R M, Cahill, D G, Fabreguette, F H, Sechrist, Z A, George, S M
Format: Article
Language:English
Online Access:Get full text
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Summary:Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Alsub 2 sub sub 3. With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of ~0.6 watts per meter per kelvin. This result suggests that high densities of iterfaces between dissimilar materials my provide a route for the production of thermal barriers with ultra-low thermal conductivity. [PUBLICATION ABSTRACT]
ISSN:0036-8075