Manufacturing with DUV lithography

Holmes et al review early manufacturing experiences at the IBM Microelectronics Division with deep ultraviolet lithography at a 248-nm wavelength.

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Bibliographic Details
Published in:IBM journal of research and development 1997-01, Vol.41 (1-2), p.7-19
Main Authors: Holmes, Steven J, Mitchell, Peter H, Hakey, Mark C
Format: Article
Language:English
Subjects:
Chemical contaminants
Manufacturing
Offset printing
Product development
R&D
Research & development
Semiconductors
Silicon nitride
Silicon wafers
Ultraviolet radiation
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Description
Summary:Holmes et al review early manufacturing experiences at the IBM Microelectronics Division with deep ultraviolet lithography at a 248-nm wavelength.
ISSN:0018-8646
0018-8646
2151-8556
DOI:10.1147/rd.411.0007