Reference sample for the evaluation of SEM image resolution at a high magnification—nanometer-scale Au particles on an HOPG substrate

• Published in: Journal of electron microscopy 2005-08, Vol.54 (4), p.345-350
• Main Authors: Okayama, Shigeo, Haraichi, Satoshi, Matsuhata, Hirofumi
• Format: Article
• Language: English
• Subjects: Au particle; beam induced contamination; HOPG; nanometer-scale particle; scanning electron microscopy
• ISSN: 0022-0744; 1477-9986; 2050-5701
• DOI: 10.1093/jmicro/dfi053

A new sample preparation technique is proposed for evaluating image resolution in a high magnification range of SEM. The proposed reference samples are uniformly distributed nanometer-scale Au particles on HOPG substrate. The samples are fabricated using the conventional ion sputter coater. The grain size and granularity are controlled by reducing the sputter-induced damage in the top layers of HOPG. The sample heating prior to SEM imaging is essential to suppress beam induced contamination. The heating time and temperature are selected to inhibit large increases in the grain sizes of Au particles. The sputter coated Au particles on the freshly cleaved HOPG substrate are superior in the deviations of particle sizes to the vacuum evaporated Au particles on the plasma etched substrates. The granularity and homogeneous distribution of Au particles on HOPG are demonstrated at a magnification range of ×180k to ×800k. The average grain size of 3.2 nm and the standard deviation of 1.3 nm are obtained under the condition of an annealing temperature of 180°C for 7 min after sputter coating an average thickness of 0.7 nm.