Application of kinoform lens for X-ray reflectivity analysis

In this paper the first practical application of kinoform lenses for the X‐ray reflectivity characterization of thin layered materials is demonstrated. The focused X‐ray beam generated from a kinoform lens, a line of nominal size ∼50 µm × 2 µm, provides a unique possibility to measure the X‐ray refl...

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Bibliographic Details
Published in:Journal of synchrotron radiation 2010-03, Vol.17 (2), p.237-242
Main Authors: Tiwari, M. K., Alianelli, L., Dolbnya, I. P., Sawhney, K. J. S.
Format: Article
Language:English
Subjects:
kinoform lens
synchrotron radiation source
thin multilayer structures
X-ray reflectivity
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Summary:In this paper the first practical application of kinoform lenses for the X‐ray reflectivity characterization of thin layered materials is demonstrated. The focused X‐ray beam generated from a kinoform lens, a line of nominal size ∼50 µm × 2 µm, provides a unique possibility to measure the X‐ray reflectivities of thin layered materials in sample scanning mode. Moreover, the small footprint of the X‐ray beam, generated on the sample surface at grazing incidence angles, enables one to measure the absolute X‐ray reflectivities. This approach has been tested by analyzing a few thin multilayer structures. The advantages achieved over the conventional X‐ray reflectivity technique are discussed and demonstrated by measurements.
ISSN:1600-5775
0909-0495
1600-5775
DOI:10.1107/S0909049509055009