Effects of temperature and reagent concentration on the morphology of chemically vapor deposited beta -Ta sub(2)O sub(5)

Crystalline beta -Ta sub(2)O sub(5) coatings were deposited on hot-isostatically-pressed Si sub(3)N sub(4) by reacting TaCl sub(5) with H sub(2) and CO sub(2) in the temperature range of 1000 degree -1300 degree C and at a pressure of 660 Pa. The Ta sub(2)O sub(5) coating generally consisted of well...

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Bibliographic Details
Published in:Journal of the American Ceramic Society 1995-01, Vol.78 (5), p.1297-1300
Main Authors: Bae, Yong W, Lee, Woo Y, Stinton, David P
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Coatings
Crystalline materials
Effects
Growth (materials)
Microcracks
Morphology
Pressure
Silicon nitride
Surfaces
Temperature
Textures
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Summary:Crystalline beta -Ta sub(2)O sub(5) coatings were deposited on hot-isostatically-pressed Si sub(3)N sub(4) by reacting TaCl sub(5) with H sub(2) and CO sub(2) in the temperature range of 1000 degree -1300 degree C and at a pressure of 660 Pa. The Ta sub(2)O sub(5) coating generally consisted of well-coalesced 2-3 mu m grains, resulting in the formation of a nonporous coating morphology. However, the presence of microcracks on the as-deposited surface was consistently observed. The surface morphology, texture, and growth rate of the coatings were examined as a function of deposition parameters.
ISSN:0002-7820