Electrodepositing amorphous Ni-W alloys for MEMS

The wearing resistance and corrosion resistance of Ni-W alloy films is more excellent than that of Ni film. As a contrast, wearing resistance and corrosion resistance of Ni and NiW films are investigated in this paper. The results show that electrodeposited amorphous Ni-W alloy films have good weari...

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Bibliographic Details
Published in:Microelectronic engineering 2010-10, Vol.87 (10), p.1901-1906
Main Authors: Wang, Hong, Liu, Rui, Cheng, FengJi, Cao, Ying, Ding, GuiFu, Zhao, XiaoLin
Format: Article
Language:English
Subjects:
Alloys
amorphous
Applied sciences
Condensed matter: structure, mechanical and thermal properties
Corrosion
Corrosion prevention
Corrosion resistance
Cross-disciplinary physics: materials science
rheology
Crystal structure
Electrodeposition, electroplating
Electronics
Exact sciences and technology
Heat treatment
Materials science
MEMS
Metals. Metallurgy
Methods of deposition of films and coatings
film growth and epitaxy
Micro- and nanoelectromechanical devices (mems/nems)
Microelectromechanical systems
Microelectronics
Ni-W
Nickel
Nickel base alloys
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Structure of solids and liquids
crystallography
Structure of specific crystalline solids
wearing resistance
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Description
Summary:The wearing resistance and corrosion resistance of Ni-W alloy films is more excellent than that of Ni film. As a contrast, wearing resistance and corrosion resistance of Ni and NiW films are investigated in this paper. The results show that electrodeposited amorphous Ni-W alloy films have good wearing resistance and excellent corrosion resistance compared with electrodeposited Ni films. Moreover, the Ni-W alloy films still had good properties after heat treatment. The good wearing resistance and corrosion resistance of amorphous Ni-W alloy films are associated with crystal structure. The micro-spinneret is fabricated successfully with amorphous Ni-W alloys by UV-LIGA technology.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2009.11.018