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Wear Characteristics and Adhesion Behavior of Calcium Phosphate Thin-Films
Wear resistance is an important mechanical property expected from coatings intended for any type of applications. Understanding of this quantity is very practical because in real situations, coatings are subjected to repeating loads experienced not in a gradual orderly fashion but abruptly and indet...
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Published in: | Key engineering materials 2010-01, Vol.443, p.469-474 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Wear resistance is an important mechanical property expected from coatings intended for any type of applications. Understanding of this quantity is very practical because in real situations, coatings are subjected to repeating loads experienced not in a gradual orderly fashion but abruptly and indeterminately. This study looked into the wear characteristic and adhesion behavior of calcium phosphate, a known bioceramics, and hopes to provide better understanding of these properties. Radio frequency-magnetron sputtering (RF-MS) was used to deposit thin film (CaP) on glass. The coatings were subjected to single-pass microscratch and multi-pass wear test while monitoring the depth, load and displacement in situ. The results have shown that the changes in the surface topography can give an indication of the wear resistance of CaP. Coatings with good adherence to the substrate have shown less alteration of its surface roughness, measured in terms of Ra values, even after several scratch passes. The study on the different parameters revealed that deposition time is the most influential factor in CaP wear behavior. This was attributed to its correlation with coating thickness. Analysis of variance (ANOVA) also suggested that the other sputtering parameters studied in the experiments (argon pressure and RF power) did not have very significant effect on the wear pattern of the CaP thin films. |
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ISSN: | 1013-9826 1662-9795 1662-9795 |
DOI: | 10.4028/www.scientific.net/KEM.443.469 |