Diamond-like carbon deposited by plasma technique as a function of methane flow rate

• Published in: Diamond and related materials 2010-07, Vol.19 (7), p.756-759
• Main Authors: Viana, G.A., Motta, E.F., da Costa, M.E.H.M., Freire, F.L., Marques, F.C.
• Format: Article
• Language: English
• Subjects: Amorphous carbon films; Cannabis; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; Deposition; Diamond-Like Carbon; Diamond-like carbon films; Exact sciences and technology; Flow rate; Fullerenes and related materials; diamonds, graphite; Gas flow; Infrared; Ion and electron beam-assisted deposition; ion plating; Materials science; Methane; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma applications; Plasma enhanced chemical vapor deposition; Plasma-based ion implantation and deposition; Reactors; Specific materials; Walls
• ISSN: 0925-9635; 1879-0062
• DOI: 10.1016/j.diamond.2010.01.043

Diamond-like carbon (a-C:H) prepared by plasma enhanced chemical vapor deposition (PECVD) as a function of methane gas flow rate is reported. Films deposited at zero flow rate, i.e., without the use of vacuum pumps during the deposition, are also investigated. For that purpose, the reactor chamber was baked and pumped down to about 10 − 8 Torr to reduce contamination released from the reactor walls. The films were analyzed by visible, infrared and Raman spectroscopes. It was observed that the deposition rate, hydrogen concentration and optical gap depend on the methane gas flow rate. A maximum for deposition rate found at methane flow was much smaller than the flow usually adopted in conventional procedures.