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Gold nanoparticles by soft UV nanoimprint lithography coupled to a lift-off process for plasmonic sensing of antibodies

In this paper, we present the results of gold nanoparticles fabrication on large area by soft UV nanoimprint lithography (UV-NIL) and lift-off process for antibodies sensing. For this fabrication, the hard polydimethylsiloxane (H-PDMS) is used as flexible mold material. A simple AMONIL/PMMA bilayer...

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Bibliographic Details
Published in:Microelectronic engineering 2010-05, Vol.87 (5), p.1001-1004
Main Authors: Barbillon, G., Hamouda, F., Held, S., Gogol, P., Bartenlian, B.
Format: Article
Language:English
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Summary:In this paper, we present the results of gold nanoparticles fabrication on large area by soft UV nanoimprint lithography (UV-NIL) and lift-off process for antibodies sensing. For this fabrication, the hard polydimethylsiloxane (H-PDMS) is used as flexible mold material. A simple AMONIL/PMMA bilayer is used to transfer patterns by etching the substrate with a suitable RIE process. The UV-NIL process has enabled to obtain gold nanoparticles with a diameter about 160 nm on a zone of 1 mm 2. For bioplasmonic applications, the sensing of Anti-Biotin was studied.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2009.11.114