Effect of electron irradiation on properties of chemically deposited TiO sub(2) nanorods

TiO sub(2) nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettabili...

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Bibliographic Details
Published in:Journal of alloys and compounds 2010-06, Vol.499 (1), p.63-67
Main Authors: Dhawale, D S, Dubal, D P, Salunkhe, R R, Gujar, T P, Rath, M C, Lokhande, C D
Format: Article
Language:English
Subjects:
Annealing
Contact angle
Electron beams
Electron bombardment
Irradiation
Nanorods
Titanium dioxide
Wettability
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Summary:TiO sub(2) nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2 degree to 9 degree , red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 10 super(6) to 10 super(3) of TiO sub(2) nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation.
ISSN:0925-8388
DOI:10.1016/j.jallcom.2010.01.126