Analytical characterization of BC(x)N(y) films generated by LPCVD with triethylamine borane

Triethylamine borane (TEAB) and He, N(2) or NH(3) were applied as additional reaction gases in the production of BC(x)N(y) layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) an...

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Bibliographic Details
Published in:Analytical and bioanalytical chemistry 2010-09, Vol.398 (2), p.1077-1084
Main Authors: Baake, Olaf, Hoffmann, Peter S, Kosinova, Marina L, Klein, Andreas, Pollakowski, Beatrix, Beckhoff, Burkhard, Fainer, Nadeshda I, Trunova, Valentina A, Ensinger, Wolfgang
Format: Article
Language:English
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Summary:Triethylamine borane (TEAB) and He, N(2) or NH(3) were applied as additional reaction gases in the production of BC(x)N(y) layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total-reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine-structure spectroscopy (TXRF-NEXAFS). The composition of the material produced without NH(3) was found to be dominated by B-C bonds with the stoichiometric formula B(2)C(3)N. B-N bonds with the formula B(2)CN(3) were preferred when NH(3) was added. A first attempt was made to compare the results obtained by applying trimethylamine borane and TEAB as single-source precursors.
ISSN:1618-2650
DOI:10.1007/s00216-010-3965-4