Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography

We demonstrate a surface energy modification method exploiting graphene film. Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently...

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Bibliographic Details
Published in:ACS nano 2010-09, Vol.4 (9), p.5464-5470
Main Authors: Kim, Bong Hoon, Kim, Ju Young, Jeong, Seong-Jun, Hwang, Jin Ok, Lee, Duck Hyun, Shin, Dong Ok, Choi, Sung-Yool, Kim, Sang Ouk
Format: Article
Language:English
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Summary:We demonstrate a surface energy modification method exploiting graphene film. Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn101491g