Growth behavior of laser-induced damage on fused silica optics under UV, ns laser irradiation

The growth behavior of laser-induced damage sites is affected by a large number of laser parameters as well as site morphology. Here we investigate the effects of pulse duration on the growth rate of damage sites located on the exit surface of fused silica optics. Results demonstrate a significant d...

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Bibliographic Details
Published in:Optics express 2010-09, Vol.18 (19), p.19966-19976
Main Authors: Negres, Raluca A, Norton, Mary A, Cross, David A, Carr, Christopher W
Format: Article
Language:English
Subjects:
Crystallization - methods
Lasers
Materials Testing
Silicon Dioxide - chemistry
Silicon Dioxide - radiation effects
Ultraviolet Rays
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Summary:The growth behavior of laser-induced damage sites is affected by a large number of laser parameters as well as site morphology. Here we investigate the effects of pulse duration on the growth rate of damage sites located on the exit surface of fused silica optics. Results demonstrate a significant dependence of the growth parameters on laser pulse duration at 351 nm from 1 ns to 15 ns, including the observation of a dominant exponential versus linear, multiple-shot growth behavior for long and short pulses, respectively. These salient behaviors are tied to the damage morphology and suggest a shift in the fundamental growth mechanisms for pulses in the 1-5 ns range.
ISSN:1094-4087
1094-4087
DOI:10.1364/oe.18.019966